The Effects of Cu Doping on Microstructure and Properties of Cu2O Target
碩士 === 義守大學 === 材料科學與工程學系 === 103 === Because of easy reaction with oxygen at ambient atmosphere, Cu2O is formed under vacuum or in a protected atmosphere. In this study, we fabricated dense Cu2O ceramics by mixing Cu2O and Cu powder. The purpose of adding copper powder is to assist the densificatio...
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ndltd-TW-103ISU051590062019-05-15T22:08:24Z http://ndltd.ncl.edu.tw/handle/yppr52 The Effects of Cu Doping on Microstructure and Properties of Cu2O Target 摻雜銅對氧化亞銅靶材顯微結構及其性質之影響 Wei-Lin Ye 葉瑋琳 碩士 義守大學 材料科學與工程學系 103 Because of easy reaction with oxygen at ambient atmosphere, Cu2O is formed under vacuum or in a protected atmosphere. In this study, we fabricated dense Cu2O ceramics by mixing Cu2O and Cu powder. The purpose of adding copper powder is to assist the densification of Cu2O by providing viscous flow during sintering processing. The concentration of copper powder is ranged from 1 to 20wt%. The effect of copper concentration on the densification behavior, microstructure and electrical property is investigated. The results showed that no any CuO phases were formed. The Cu2O ceramic has a lowest electrical resistivity about 5.4×104Ω.cm at 10wt% of copper addition. In addition, the relative density can reach to 99.99% at sintering temperature 1000℃ and 1050℃. The apparent porosity also decreased to 0.41%. Whereas the same performance can be also achieved by hot-pressing process. Boen Houng 洪博彥 2015 學位論文 ; thesis 99 zh-TW |
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碩士 === 義守大學 === 材料科學與工程學系 === 103 === Because of easy reaction with oxygen at ambient atmosphere, Cu2O is formed under vacuum or in a protected atmosphere. In this study, we fabricated dense Cu2O ceramics by mixing Cu2O and Cu powder. The purpose of adding copper powder is to assist the densification of Cu2O by providing viscous flow during sintering processing. The concentration of copper powder is ranged from 1 to 20wt%. The effect of copper concentration on the densification behavior, microstructure and electrical property is investigated.
The results showed that no any CuO phases were formed. The Cu2O ceramic has a lowest electrical resistivity about 5.4×104Ω.cm at 10wt% of copper addition. In addition, the relative density can reach to 99.99% at sintering temperature 1000℃ and 1050℃. The apparent porosity also decreased to 0.41%. Whereas the same performance can be also achieved by hot-pressing process.
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Boen Houng |
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Boen Houng Wei-Lin Ye 葉瑋琳 |
author |
Wei-Lin Ye 葉瑋琳 |
spellingShingle |
Wei-Lin Ye 葉瑋琳 The Effects of Cu Doping on Microstructure and Properties of Cu2O Target |
author_sort |
Wei-Lin Ye |
title |
The Effects of Cu Doping on Microstructure and Properties of Cu2O Target |
title_short |
The Effects of Cu Doping on Microstructure and Properties of Cu2O Target |
title_full |
The Effects of Cu Doping on Microstructure and Properties of Cu2O Target |
title_fullStr |
The Effects of Cu Doping on Microstructure and Properties of Cu2O Target |
title_full_unstemmed |
The Effects of Cu Doping on Microstructure and Properties of Cu2O Target |
title_sort |
effects of cu doping on microstructure and properties of cu2o target |
publishDate |
2015 |
url |
http://ndltd.ncl.edu.tw/handle/yppr52 |
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