The Experimental Study of Photo Resist Reduction for Spin Coating

碩士 === 中原大學 === 機械工程研究所 === 103 === In order to reduces photoresist waste rate and costs in this technical papers. Because research plan and appear Finger-like instability、poor coating and discolor condition. Both are reduction photoresist endures one. On the other hand, and thereby reducing environ...

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Bibliographic Details
Main Authors: Deng-Kai Hu, 胡登凱
Other Authors: Yeeu-Chang Lee
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/3wf3mk

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