The Experimental Study of Photo Resist Reduction for Spin Coating
碩士 === 中原大學 === 機械工程研究所 === 103 === In order to reduces photoresist waste rate and costs in this technical papers. Because research plan and appear Finger-like instability、poor coating and discolor condition. Both are reduction photoresist endures one. On the other hand, and thereby reducing environ...
Main Authors: | Deng-Kai Hu, 胡登凱 |
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Other Authors: | Yeeu-Chang Lee |
Format: | Others |
Language: | zh-TW |
Published: |
2014
|
Online Access: | http://ndltd.ncl.edu.tw/handle/3wf3mk |
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