Application of magnetic particles (Fe3O4) on chemical mechanical polishing (CMP) wastewater treatment and regeneration for reuse
碩士 === 國立雲林科技大學 === 環境與安全衛生工程系 === 102 === In this study, the magnetic particles with the applied field, investigate the effect of the chemical mechanical polishing (CMP) the effectiveness of the wastewater treatment, and by adjusting the pH, with rapid stirring, and the feasibility of the magnetic...
Main Authors: | Pin-ChunHsieh, 謝濱駿 |
---|---|
Other Authors: | Terng-Jou Wan |
Format: | Others |
Language: | zh-TW |
Published: |
2014
|
Online Access: | http://ndltd.ncl.edu.tw/handle/14417843359337310340 |
Similar Items
-
Reclamation and Reuse for Chemical Mechanical Polishing (CMP) Wastewater Assessment
by: Wei Wei, et al.
Published: (2004) -
Magnetic-Seeding Aggregation of Nanoparticles from Chemical Mechanical Polishing(CMP) Wastewater
by: Pei-Wun Chen, et al.
Published: (2004) -
The application of Membrane on the Recycling and Reuse of CMP Wastewater: The Cost Analysis
by: Pei-Yi Ho, et al.
Published: (2011) -
The effects of magnetic nanoparticles embedded with SA/PVA and pH on chemical-mechanical polishing wastewater and magnetic particle regeneration and recycle
by: Chung-Fu Huang, et al.
Published: (2017-12-01) -
Ice and abrasive particles : an alternative CMP polishing technique
by: Born, Melanie P. (Melanie Providencia), 1975-
Published: (2005)