A study of exposure system design for UV LED

• Main Authors: Jian-Wei Hung, 洪健瑋
• Other Authors: Ching-Huang Lin
• Format: Others
• Language: zh-TW
• Published: 2014
• Online Access: http://ndltd.ncl.edu.tw/handle/63427547118502667702

碩士 === 國立雲林科技大學 === 電子工程系 === 102 === UV curing technology has been developed in the industry for many years, but the relatively slow development in Taiwan.The majority of UV curving system is still using the traditional high-pressure mercury lamp. The purpose of this study is the application of ultraviolet light emitting diodes in curing technology.Therefore, this study clearly defined uniformity, light utilization, exposure area, sizes and working distances, expect that by its open and bright with long life and other advantages, to replace mercury lamps currently used. In this paper, the use of ray tracing simulation software TracePro. Using two different types of light sources, and analyzed for uniformity and irradiance. And the use of Solidworks and ZEMAX established two freeform collimator lamp refractor, to improve light efficiency. Exposure system comprising the collimator lamp refractor,fly-eye lenslets, a reflective mirror, a collimator lens, by changing the parameters of the optical element, the exposure system to understand the relationship and impact. The results obtained, the nonuniformity 5% can be achieved and the light efficiency of more than 20%, irradiance intensity greater than 20mW/cm2 pre-set 6-inch round area.