Enhancing Electron Field Emission Properties of Carbon Nanoflakes by Post-annealing and Carbon Coating Processes

碩士 === 大同大學 === 光電工程研究所 === 102 === In this study, carbon nanoflakes (CNFs) were deposited by RF magnetron sputtering on Si substrate. The thickness of the CNF was about 420 nm with porous surface morphology. After deposition, the sample was put into the high-temperature furnace to improve the elect...

Full description

Bibliographic Details
Main Authors: Chia-an Chou, 周家安
Other Authors: Wen-ching Shin
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/5kayt5
id ndltd-TW-102TTU05124004
record_format oai_dc
spelling ndltd-TW-102TTU051240042019-05-15T21:32:55Z http://ndltd.ncl.edu.tw/handle/5kayt5 Enhancing Electron Field Emission Properties of Carbon Nanoflakes by Post-annealing and Carbon Coating Processes 奈米碳片進行表面披覆熱處理以提升其場發射特性 Chia-an Chou 周家安 碩士 大同大學 光電工程研究所 102 In this study, carbon nanoflakes (CNFs) were deposited by RF magnetron sputtering on Si substrate. The thickness of the CNF was about 420 nm with porous surface morphology. After deposition, the sample was put into the high-temperature furnace to improve the electron field emission properties by flowing the H2、C2H2 or H2+ C2H2 atmosphere. From the experimental results, we find the turn-on field could be reduced from 4.5 to 2.89 V/μm; and the current density could be increased from 46 to 4011 μA/cm2 with the applied field of 7.2 V/μm. Wen-ching Shin 施文欽 2014 學位論文 ; thesis 59 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 大同大學 === 光電工程研究所 === 102 === In this study, carbon nanoflakes (CNFs) were deposited by RF magnetron sputtering on Si substrate. The thickness of the CNF was about 420 nm with porous surface morphology. After deposition, the sample was put into the high-temperature furnace to improve the electron field emission properties by flowing the H2、C2H2 or H2+ C2H2 atmosphere. From the experimental results, we find the turn-on field could be reduced from 4.5 to 2.89 V/μm; and the current density could be increased from 46 to 4011 μA/cm2 with the applied field of 7.2 V/μm.
author2 Wen-ching Shin
author_facet Wen-ching Shin
Chia-an Chou
周家安
author Chia-an Chou
周家安
spellingShingle Chia-an Chou
周家安
Enhancing Electron Field Emission Properties of Carbon Nanoflakes by Post-annealing and Carbon Coating Processes
author_sort Chia-an Chou
title Enhancing Electron Field Emission Properties of Carbon Nanoflakes by Post-annealing and Carbon Coating Processes
title_short Enhancing Electron Field Emission Properties of Carbon Nanoflakes by Post-annealing and Carbon Coating Processes
title_full Enhancing Electron Field Emission Properties of Carbon Nanoflakes by Post-annealing and Carbon Coating Processes
title_fullStr Enhancing Electron Field Emission Properties of Carbon Nanoflakes by Post-annealing and Carbon Coating Processes
title_full_unstemmed Enhancing Electron Field Emission Properties of Carbon Nanoflakes by Post-annealing and Carbon Coating Processes
title_sort enhancing electron field emission properties of carbon nanoflakes by post-annealing and carbon coating processes
publishDate 2014
url http://ndltd.ncl.edu.tw/handle/5kayt5
work_keys_str_mv AT chiaanchou enhancingelectronfieldemissionpropertiesofcarbonnanoflakesbypostannealingandcarboncoatingprocesses
AT zhōujiāān enhancingelectronfieldemissionpropertiesofcarbonnanoflakesbypostannealingandcarboncoatingprocesses
AT chiaanchou nàimǐtànpiànjìnxíngbiǎomiànpīfùrèchùlǐyǐtíshēngqíchǎngfāshètèxìng
AT zhōujiāān nàimǐtànpiànjìnxíngbiǎomiànpīfùrèchùlǐyǐtíshēngqíchǎngfāshètèxìng
_version_ 1719117273655934976