Study of Enhancing Performance of UV Oval Condenser Mirror of Exposure Machine
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 102 === In this thesis presents that two materials of ZrO2 and SiO2 were used to prepare multi-dielectric layers by an electron-gun evaporation technique. Measurements and analysis for the optical properties, surface roughness, We expect to get more information abo...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/unu8gt |
| Summary: | 碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 102 === In this thesis presents that two materials of ZrO2 and SiO2 were used to prepare multi-dielectric layers by an electron-gun evaporation technique. Measurements and analysis for the optical properties, surface roughness, We expect to get more information about multilayer coatings in ultraviolet (UV) Oval Condenser Mirror.
After running several tests and experiments, we have produced multilayer coatings for UV reflector. Based on the various measuring data analysis, the main working wave of Exposure machine is between 350- 450nm with more than 95% reflection rate. The source of infrared rays has 90% penetration. It can lower the temperature on the object effectively. The characteristic of optic has reached the industrial standard. The result of performance on the actual machine has reached the heat impact index within 250℃. The quality and stability of the UV reflector is able to compete with the current mainstream from Japanese OEM product. Besides, it can assist optical components of Taiwan in lowing the cost of purchasing optical part 35% minimum as well as enhancing the competitiveness.
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