Overlay-Aware Detailed Routing for Self-Aligned DoublePatterning Lithography Using the Cut Process
碩士 === 國立臺灣大學 === 電子工程學研究所 === 102 === Self-aligned double patterning (SADP) is one of the most promising techniques for sub-20nm technology. Spacer-is-dielectric SADP using a cut process is getting popular because of its higher design flexibility; for example, it can decompose odd cycles without th...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/19975894655573636268 |