Application and Characteristics of WO3 Thin Films Prepared Using the Electrodeposition Method

• Main Authors: Li Lin, 林利
• Other Authors: Tun-Ping Teng
• Format: Others
• Language: zh-TW
• Published: 2014
• Online Access: http://ndltd.ncl.edu.tw/handle/27763240138016748418

碩士 === 國立臺灣師範大學 === 工業教育學系 === 102 === In this study, we produced the tungsten oxide (WO3) thin films on the indium tin oxide (ITO) glass by the electrodeposition method (ED). The characteristics of glass coated with WO3 thin films were measured and analyzed by using the HR-FESEM, XRD and α-STEP; moreover, the ED current, ED time and annealing temperature to influence the structure and characteristics of WO3 thin film were discussed. Finally, the optimal process parameters of WO3 coated glass with better properties were screened to conduct the applied research for thermal insulation. The experimental results showed that the WO3 film thickness is proportional to the ED current when the ED current at 3, 5 and 7 mA, and the deposition rate were 2, 4.9, and 7.6 nm/sec, respectively. The structure of WO3 thin films peeled when the ED current was over 7 mA, so the ED current should be controlled under 7 mA. As for the crystallization of the WO3 thin films, it was amorphous with controlled by as-deposited and annealing at 250 ℃; triclinic with annealing at 500 ℃ and 700 ℃. The optical characteristics of the coated glasses with amorphous or triclinic WO3 had anti-infrared and high infrared transmittance properties, respectively. As for the thermal insulation of WO3 coated glass, the WO3 coated glass had the best thermal insulation performance with annealing at 250 ℃, and the rise rate of temperature and the final temperature were 0.131 ℃/min and 36.89 ℃, respectively. The characteristics of WO3 coated glass can be tuned by different process parameters to form the element with the proper characteristics to meet different application, which can achieve the purpose of improving efficiency and energy conservation.