| Summary: | 博士 === 國立清華大學 === 動力機械工程學系 === 102 === This thesis proposes a novel methodology that integrates a coating process and roll-to-roll nanoimprint lithography (R2R NIL) to achieve the near-zero thickness of the residual layer of nanostructures. In this study, the coating process is aimed at forming specific patterns, in correspondence with the desired nanostructures, instead of only a thin film on the substrate, for attaining nanostructures with a near-zero residual layer. First, we constructed the theoretical models of various coating processes in association with the R2R NIL. Second, a novel methodology that integrates coating and imprinting processes is proposed based on the developed theoretical models. Third, a method for minimizing the thickness of the residual layer of the nanostructure was developed by optimizing the process parameters. Finally, we performed an experimental study to verify the feasibility of the theoretical models and optimization method.
R2R nanoimprint technology has already shown potential in the manufacturing of soft electronics-related products. However, the filling ratio and web transportation performance of R2R nanoimprinting depends on several mechanical parameters, and their effects must be evaluated for system optimization and device integrity considerations. This study began with the theoretical modelling of coating technologies, such as an inkjet printer and offset gravure coater for coating the ultraviolet resist with the controlled pattern and volume on the polyethylene terephthalate (PET) substrate, to reduce the residual layer. In the imprint process, the original thickness and uniformity of the resist considerably influences the thickness of the residual layer. As the initial thickness of the resist becomes thinner, the thickness of the residual layer becomes thinner accordingly.
Finally, we developed a fabrication process for the large-area antireflection near-zero residual layer nanostructure on a PET substrate with a transmittance ratio of 96.2% in visible spectroscopy, contact angle of 153°, and transmittance ratio of 5% in infrared ray.
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