Characterization of the L-MOS with Different Channel Structures for SONOS application

碩士 === 國立中山大學 === 電機工程學系研究所 === 102 === In this paper, in order to overcome the scale down issue, a novel metal oxide semiconductor field effect transistor with L-shaped channel structure (L-MOS) [1], and new L-shaped channel structure for SONOS-type nonvolatile memory (L-SONOS) are designed and stu...

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Main Authors: Hung-Pei Hsu, 許宏裴
Other Authors: Jyi-Tsong Lin
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/32617658099180517466
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spelling ndltd-TW-102NSYS54420682017-04-23T04:27:02Z http://ndltd.ncl.edu.tw/handle/32617658099180517466 Characterization of the L-MOS with Different Channel Structures for SONOS application 新式L型通道之金氧半場效電晶體的通道變化探討以及應用在電荷捕陷式非揮發性記憶體的研究 Hung-Pei Hsu 許宏裴 碩士 國立中山大學 電機工程學系研究所 102 In this paper, in order to overcome the scale down issue, a novel metal oxide semiconductor field effect transistor with L-shaped channel structure (L-MOS) [1], and new L-shaped channel structure for SONOS-type nonvolatile memory (L-SONOS) are designed and studied. Besides, the several types of L-shaped structures are also demonstrated. Meanwhile, we use Fowler-Nordheim tunneling (FN tunneling) mechanism for memory''s program and erase, and analyses the memory window, retention time, endurance, and drain disturb. Studied and compared with the conventional MOSFET device for the same average gate length (Lavg), the proposed device electrical characteristics are analyzed and evaluated by three dimension (3-D) Sentaurus TCAD simulators. It can be confirmed that the L-MOS device''s drain current(ID) have been improved more than 103 % as compared to that of Conv-MOS andthe device has lower drain-induced barrier lowering (DIBL) and subthreshold swing (S.S.) than its conventional counterpart has. In addition, the transconductance and voltage gain properties of the L-MOS are also improved 75.8 % and 70.9 % than its counterpart. In addition, we analyze the electrical characteristics of the L-SONOS. Because of the L-shaped channel structure, L-SONOS reveals a better gate controllability. The memory window of it improves 50.89 % compare with Conv-SONOS, and better retention time performance has been seen. In addition, the Vth shift at drain disturb performance of the new device only falls 38.9 % compare to 65.3 % of the conventional device(Conv-SONOS) does. Although the L-SONOS''s endurance performance is lower than conventional one, the overall performance of the L-SONOS still can be said that it is a better SONOS memory device than its counterpart, Conv-SONOS. Jyi-Tsong Lin 林吉聰 2014 學位論文 ; thesis 93 zh-TW
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description 碩士 === 國立中山大學 === 電機工程學系研究所 === 102 === In this paper, in order to overcome the scale down issue, a novel metal oxide semiconductor field effect transistor with L-shaped channel structure (L-MOS) [1], and new L-shaped channel structure for SONOS-type nonvolatile memory (L-SONOS) are designed and studied. Besides, the several types of L-shaped structures are also demonstrated. Meanwhile, we use Fowler-Nordheim tunneling (FN tunneling) mechanism for memory''s program and erase, and analyses the memory window, retention time, endurance, and drain disturb. Studied and compared with the conventional MOSFET device for the same average gate length (Lavg), the proposed device electrical characteristics are analyzed and evaluated by three dimension (3-D) Sentaurus TCAD simulators. It can be confirmed that the L-MOS device''s drain current(ID) have been improved more than 103 % as compared to that of Conv-MOS andthe device has lower drain-induced barrier lowering (DIBL) and subthreshold swing (S.S.) than its conventional counterpart has. In addition, the transconductance and voltage gain properties of the L-MOS are also improved 75.8 % and 70.9 % than its counterpart. In addition, we analyze the electrical characteristics of the L-SONOS. Because of the L-shaped channel structure, L-SONOS reveals a better gate controllability. The memory window of it improves 50.89 % compare with Conv-SONOS, and better retention time performance has been seen. In addition, the Vth shift at drain disturb performance of the new device only falls 38.9 % compare to 65.3 % of the conventional device(Conv-SONOS) does. Although the L-SONOS''s endurance performance is lower than conventional one, the overall performance of the L-SONOS still can be said that it is a better SONOS memory device than its counterpart, Conv-SONOS.
author2 Jyi-Tsong Lin
author_facet Jyi-Tsong Lin
Hung-Pei Hsu
許宏裴
author Hung-Pei Hsu
許宏裴
spellingShingle Hung-Pei Hsu
許宏裴
Characterization of the L-MOS with Different Channel Structures for SONOS application
author_sort Hung-Pei Hsu
title Characterization of the L-MOS with Different Channel Structures for SONOS application
title_short Characterization of the L-MOS with Different Channel Structures for SONOS application
title_full Characterization of the L-MOS with Different Channel Structures for SONOS application
title_fullStr Characterization of the L-MOS with Different Channel Structures for SONOS application
title_full_unstemmed Characterization of the L-MOS with Different Channel Structures for SONOS application
title_sort characterization of the l-mos with different channel structures for sonos application
publishDate 2014
url http://ndltd.ncl.edu.tw/handle/32617658099180517466
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