Low Temperature Growth and Fabrication of Silicon-based Epitaxial Germanium Films and Photodetectors
碩士 === 國立中央大學 === 光電科學與工程學系 === 102 === In this research, we use the electron cyclotron resonance chemical vapor deposition (ECR-CVD) to grow epitaxial germanium (Ge) thin films on single crystal silicon substrates (c-Si) and applied to the photodetector at a low temperature. Compared to Si, Ge ha...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/g8f62e |