The Optimized Simulation of OLED Planar Evaporation Heater Design and Chamber Flow Field

• Main Authors: Zhe-Wei Kuo, 郭哲瑋
• Other Authors: Ting-Tung Li
• Format: Others
• Language: zh-TW
• Published: 2014
• Online Access: http://ndltd.ncl.edu.tw/handle/40801103786644365124

碩士 === 國立中央大學 === 機械工程學系 === 102 === Since the surface evaporation technique is less cost compared to the point evaporation and the line evaporation technique, it is focused by the research and development from major OLED manufacturers recently. There are five major points to study: (1).The planar heater size is 325×435mm2 (2).The operating temperature is 500℃ (3).The temperature uniformity at steady state < 1% (the operating pressure is 3~6х10-5torr) (4). At heating time 600s, the temperature uniformity < 3% and heating rate >100℃/min (5). The flow field uniformity < 3%. In this research, we use the finite element analysis software, ANSYS and computational fluid dynamics, Fluent, to simulate the arrangement of the large-area evaporation deposition heating source in infrared lamp. Besides, we also design the reflector to get more uniform temperature on susceptor. At the end, we study the flow field to find out how the stream influence the deposition on glass substrate. These studies will be the base lines for the R2R (run to run) evaporation technology in the future.