| Summary: | 碩士 === 國立交通大學 === 平面顯示技術碩士學位學程 === 102 === Through the discharge of cathode tip from the backside of substrate, FED emits electrons to excite phosphor to the fluorescent layer of the front panel. The characteristics of FED are self-luminous, low power consumption, high brightness, wild viewing angle, and fast response. Therefore, in the process of using electrolytic solution to the substrate layer to form the tip of cathode has become an important procedure.
In the process of Cathode tip, the electrolytic solution in Halo Etchant is DMSO. During the halo etching process, DMSO with the substrate will be immersed into the organic wastewater treatment tank. Because the treatment of organic wastewater will generate DMS compound, which has smelly cloves. The environmental protection agency and has been planning the monitoring and regular sample of test. In addition to temporary collect the waste liquid and wastewater of DMS, it is necessary to find out the solvent that can replace DMSO in order to avoid environmental problems. Research for the electrolytic etching solution replacement of Halo Etchant, and achieve the performance will become one of the most important FED developments in Taiwan.
In the study, we use stratification of QC Seven Techniques to select the replacement solvent and design a basic electrochemical cell experiments to verify process capability index (Cpk).The Taguchi method is used to identify the most influential factor in etching rate. Based on this factor and by carrying out the experiment, electron microscopy and EDX are used to determine the glass specimen reaction of the etching rate, depth and surface residual substance. The performance of replacement solvent one compare with DMSO solution.
The result shows that the solution of EG could replace the solution of DMSO. Through the etching rate, depth, and the threshold of voltage range, the verification result meets the specification requirements.
|
|---|
