Electrical-transport properties of micrometer-sized CoSi2/normal-metal interfaces
碩士 === 國立交通大學 === 電子物理系所 === 102 === Cobalt silicide has its own importance not only in industry but also in the basic of scientific investigation. In this paper, we have produced two different pattern of cobalt silicide film, and deposited metal on the film, measured electrical-transport properties...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/3qr3rb |