Enhancing Light Output of GaN-Based VLED Via Electrode Pattern Design and Anisotropic Surface Etching

碩士 === 國立成功大學 === 微電子工程研究所 === 102 === Nowadays, the crystal quality and wall plug efficiency (WPE) of GaN-based blue light-emitting diodes have been significantly improved, because of the continuous advances in metal organic chemical vapor deposition technology and VLED chip processing. For vertica...

Full description

Bibliographic Details
Main Authors: YangChen, 陳揚
Other Authors: Shui-Jinn Wang
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/54969749211129171615
id ndltd-TW-102NCKU5428001
record_format oai_dc
spelling ndltd-TW-102NCKU54280012016-07-02T04:20:39Z http://ndltd.ncl.edu.tw/handle/54969749211129171615 Enhancing Light Output of GaN-Based VLED Via Electrode Pattern Design and Anisotropic Surface Etching 利用電極設計與非等向性蝕刻提升氮化鎵發光二極體光輸出之研究 YangChen 陳揚 碩士 國立成功大學 微電子工程研究所 102 Nowadays, the crystal quality and wall plug efficiency (WPE) of GaN-based blue light-emitting diodes have been significantly improved, because of the continuous advances in metal organic chemical vapor deposition technology and VLED chip processing. For vertical structure GaN-based LEDs (VLEDs), light emission from the n-GaN surface is strongly affected by the cathode electrode pattern which should keep both the contact resistance and light shielding ratio as small as possible. The advantages of VLED structure are series resistance reduction and WPE increment as compared with the conventional LED structure, however, the current crowding effect would severely decrease the WPE especially at high current condition (〉1 A). In this study, to alleviate the current crowding in VLEDs, a two-step ladder surface morphology using inductive coupled plasma (ICP) etching depth and cathode electrode pattern optimization of top n-GaN layer of VLEDs are proposed to improve the current spreading and the light emission uniformity. The same structure is simulated by the Crosslight simulation tool for verification as well. The use of inductively coupled plasma (ICP) 2-step mesa etching on the n-GaN layer and optimized cathode electrode pattern were examined both theoretically and experimentally. Good agreements between simulation and experiments are obtained. Our experimental results show that, as compared to regular VLED with flat n-GaN structure and regular electrode, the proposed VLEDs in this paper shows the highest increase in light output power (Lop) by 19.2% at 350 mA. It is expected that the proposed 2-step mesa scheme to improve current spreading in this work could offer potential applications in optoelectronics in the near future. Shui-Jinn Wang 王水進 2014 學位論文 ; thesis 60 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立成功大學 === 微電子工程研究所 === 102 === Nowadays, the crystal quality and wall plug efficiency (WPE) of GaN-based blue light-emitting diodes have been significantly improved, because of the continuous advances in metal organic chemical vapor deposition technology and VLED chip processing. For vertical structure GaN-based LEDs (VLEDs), light emission from the n-GaN surface is strongly affected by the cathode electrode pattern which should keep both the contact resistance and light shielding ratio as small as possible. The advantages of VLED structure are series resistance reduction and WPE increment as compared with the conventional LED structure, however, the current crowding effect would severely decrease the WPE especially at high current condition (〉1 A). In this study, to alleviate the current crowding in VLEDs, a two-step ladder surface morphology using inductive coupled plasma (ICP) etching depth and cathode electrode pattern optimization of top n-GaN layer of VLEDs are proposed to improve the current spreading and the light emission uniformity. The same structure is simulated by the Crosslight simulation tool for verification as well. The use of inductively coupled plasma (ICP) 2-step mesa etching on the n-GaN layer and optimized cathode electrode pattern were examined both theoretically and experimentally. Good agreements between simulation and experiments are obtained. Our experimental results show that, as compared to regular VLED with flat n-GaN structure and regular electrode, the proposed VLEDs in this paper shows the highest increase in light output power (Lop) by 19.2% at 350 mA. It is expected that the proposed 2-step mesa scheme to improve current spreading in this work could offer potential applications in optoelectronics in the near future.
author2 Shui-Jinn Wang
author_facet Shui-Jinn Wang
YangChen
陳揚
author YangChen
陳揚
spellingShingle YangChen
陳揚
Enhancing Light Output of GaN-Based VLED Via Electrode Pattern Design and Anisotropic Surface Etching
author_sort YangChen
title Enhancing Light Output of GaN-Based VLED Via Electrode Pattern Design and Anisotropic Surface Etching
title_short Enhancing Light Output of GaN-Based VLED Via Electrode Pattern Design and Anisotropic Surface Etching
title_full Enhancing Light Output of GaN-Based VLED Via Electrode Pattern Design and Anisotropic Surface Etching
title_fullStr Enhancing Light Output of GaN-Based VLED Via Electrode Pattern Design and Anisotropic Surface Etching
title_full_unstemmed Enhancing Light Output of GaN-Based VLED Via Electrode Pattern Design and Anisotropic Surface Etching
title_sort enhancing light output of gan-based vled via electrode pattern design and anisotropic surface etching
publishDate 2014
url http://ndltd.ncl.edu.tw/handle/54969749211129171615
work_keys_str_mv AT yangchen enhancinglightoutputofganbasedvledviaelectrodepatterndesignandanisotropicsurfaceetching
AT chényáng enhancinglightoutputofganbasedvledviaelectrodepatterndesignandanisotropicsurfaceetching
AT yangchen lìyòngdiànjíshèjìyǔfēiděngxiàngxìngshíkètíshēngdànhuàjiāfāguāngèrjítǐguāngshūchūzhīyánjiū
AT chényáng lìyòngdiànjíshèjìyǔfēiděngxiàngxìngshíkètíshēngdànhuàjiāfāguāngèrjítǐguāngshūchūzhīyánjiū
_version_ 1718332198477627392