Optimization of the etching parameters for photo alignment using experimental design

碩士 === 國立中興大學 === 機械工程學系所 === 102 === Semiconductor manufacturing process can be divided into five processes: filming, lithography, etching, diffusion, and chemical mechanical polishing. In this rapid technology changing era, a semiconductor device must accommodate more effective circuits in a space...

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Bibliographic Details
Main Authors: Chan-Jung Chang, 張展榮
Other Authors: Gou-Jen Wang
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/27661689516641187052