Low-loss hybrid plasmonic waveguide applied in novelthrough-silicon via technologies

碩士 === 國立中興大學 === 物理學系所 === 102 === In the research we construct a hybrid low-loss plasmonic waveguide using the subwavelength mode area of plasmonic waveguides. The proposed structure is composed of a metallic nanowire covered by low-index silica, high-index silicon and low-index silica from inner...

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Main Authors: Tang-Chin Hung, 洪堂欽
Other Authors: 黃家健
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/98049178334132873460
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spelling ndltd-TW-102NCHU51980402017-06-17T04:31:36Z http://ndltd.ncl.edu.tw/handle/98049178334132873460 Low-loss hybrid plasmonic waveguide applied in novelthrough-silicon via technologies 以混合型低損耗電漿波導作為先進矽穿孔結構之研究 Tang-Chin Hung 洪堂欽 碩士 國立中興大學 物理學系所 102 In the research we construct a hybrid low-loss plasmonic waveguide using the subwavelength mode area of plasmonic waveguides. The proposed structure is composed of a metallic nanowire covered by low-index silica, high-index silicon and low-index silica from inner to outer layers, respectively. By the metallic nanowire, the proposed structure is thus introduced in novel semiconductor through-silicon via (TSV) technologies and 3D integrated circuits processes. Moreover, we also study the coupling strengths of two parallel waveguides arranged in x and y directions for evaluating the integration density. The proposed structure is able to propagate beyond hundreds of micrometers with subwavelength mode areas because of the symmetric structure with respect to the metallic nanowire. These characteristics apparently help us compute precisely the compactness of TSV technologies and make that the proposed hybrid plasmonic waveguide is advantage to apply in the high-density integration of optical signal transporation. 黃家健 2014 學位論文 ; thesis 42 zh-TW
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language zh-TW
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description 碩士 === 國立中興大學 === 物理學系所 === 102 === In the research we construct a hybrid low-loss plasmonic waveguide using the subwavelength mode area of plasmonic waveguides. The proposed structure is composed of a metallic nanowire covered by low-index silica, high-index silicon and low-index silica from inner to outer layers, respectively. By the metallic nanowire, the proposed structure is thus introduced in novel semiconductor through-silicon via (TSV) technologies and 3D integrated circuits processes. Moreover, we also study the coupling strengths of two parallel waveguides arranged in x and y directions for evaluating the integration density. The proposed structure is able to propagate beyond hundreds of micrometers with subwavelength mode areas because of the symmetric structure with respect to the metallic nanowire. These characteristics apparently help us compute precisely the compactness of TSV technologies and make that the proposed hybrid plasmonic waveguide is advantage to apply in the high-density integration of optical signal transporation.
author2 黃家健
author_facet 黃家健
Tang-Chin Hung
洪堂欽
author Tang-Chin Hung
洪堂欽
spellingShingle Tang-Chin Hung
洪堂欽
Low-loss hybrid plasmonic waveguide applied in novelthrough-silicon via technologies
author_sort Tang-Chin Hung
title Low-loss hybrid plasmonic waveguide applied in novelthrough-silicon via technologies
title_short Low-loss hybrid plasmonic waveguide applied in novelthrough-silicon via technologies
title_full Low-loss hybrid plasmonic waveguide applied in novelthrough-silicon via technologies
title_fullStr Low-loss hybrid plasmonic waveguide applied in novelthrough-silicon via technologies
title_full_unstemmed Low-loss hybrid plasmonic waveguide applied in novelthrough-silicon via technologies
title_sort low-loss hybrid plasmonic waveguide applied in novelthrough-silicon via technologies
publishDate 2014
url http://ndltd.ncl.edu.tw/handle/98049178334132873460
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