Effects of ammonia/ethylene ratios on characteristics of plasma enhanced chemical vapor deposition n-type amorphous carbon thin films
碩士 === 國立中興大學 === 材料科學與工程學系所 === 102 === This study investigates the effect of ammonia/eth ylene (NH3 /C2 H4 )mixtures on characteristics of nitrogen-doped amorphous hydrogenated carbon a-C:N films prepared by plasma enhanced chemical vapor deposition. The a-C:N films with identic...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/41735516873421406493 |