Effects of element addition on the microstructure, mechanical and anticorrosion properties of Ti and Zr-based thin film metallic glasses

• Main Authors: Yu-Lun Deng, 鄧宇倫
• Other Authors: Jyh-Wei Lee
• Format: Others
• Language: zh-TW
• Published: 2014
• Online Access: http://ndltd.ncl.edu.tw/handle/39622086994840518272

碩士 === 明志科技大學 === 材料工程系碩士班 === 102 === Recently, the thin film metallic glass materials have attracted lots of attentions due to their amorphous structure and unique properties. In this work, a series of Ti and Zr-based metallic glass thin films (TFMGs) were prepared by a magnetron co-sputtering system. The boron, silicon and titanium was introduce during thin films deposition process .The amorphous structures of coatings were determined by a glancing angle X-ray diffractometer. The surface and cross sectional morphologies of thin films were examined by scanning electron microscopy (SEM). The surface roughness of thin films was explored by atomic force microscopy (AFM). A nanoindenter, a scratch tester and HRC-DB adhesion test were used to evaluate the hardness and adhesion properties of thin films, respectively. In addition, The anti-corrosion properties of TFMGs were evaluated by the potentiodynamic polarization tests in 5.0 wt.% NaCl aqueous solution. In the first stage, the microstructure of Ti-Zr-B thin film was changed from columnar to fine and dense feature after the substrate bias applied. The oxygen content of TFMG was also decreased effectively. The corrosion resistance of Ti-Zr-B TFMG increased with increasing boron content. For the Zr-Ti-B-Si TFMGs fabricated in the second stage, the hardness, adhesion property and anti corrosion performance increased with increasing silicon content. The highest hardness, 12 GPa, was obtained for the TFMG containg 17.3 at.% Si.(Z4 sample). The polarization resistance of TFMG increased 46.7 times as compared with the bare AISI420 stainless steel substrate. However, the lower corrosion resistance of TFMG was found when the higher titanium content 17.0 at.%, and lower silicon content, 13.1 at.%, were obtained (Z5 sample). Nevertheless, a better HRC-DB adhesion quality, HF2, was achieved for this Zr-Ti-B-Si (Z5) TFMG.