Low-heating-rate Annealing in Improving Electrical and Optical Properties of In-line Sputtered Indium Tin Oxide films

Low-heating-rate Annealing in Improving Electrical and Optical Properties of In-line Sputtered Indium Tin Oxide films

碩士 === 崑山科技大學 === 電機工程研究所 === 102 === This work applied one in-line sputtering tool to deposit indium tin oxide (ITO) films.The ITO films were following annealed in vacuum with low-heating rate of 10℃/min or traditional heating rate of 18℃～25℃/min. Structural, electrical and optical properties of IT...

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Main Authors: Chih-Yi Chien, 簡志頤
Other Authors: Shang-Chou Chang
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/24968349805525200763
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spelling ndltd-TW-102KSUT04420182016-05-22T04:34:29Z http://ndltd.ncl.edu.tw/handle/24968349805525200763 Low-heating-rate Annealing in Improving Electrical and Optical Properties of In-line Sputtered Indium Tin Oxide films 低加熱速率退火改善直線式連續濺鍍氧化銦錫薄膜光電特性 Chih-Yi Chien 簡志頤 碩士 崑山科技大學 電機工程研究所 102 This work applied one in-line sputtering tool to deposit indium tin oxide (ITO) films.The ITO films were following annealed in vacuum with low-heating rate of 10℃/min or traditional heating rate of 18℃～25℃/min. Structural, electrical and optical properties of ITO films vacuum annealed with low-heating rate or traditional heating rate were compared. The results indicate electrical and optical properties of ITO films vacuum annealed with low-heating rate are better than those with traditional heating rate. The ITO films vacuum annealed at 500oC with low-heating rate can have electric resistivity of 2.40×10-4Ω-cm and average optical transmittance in visible wavelength region of 93.10%. Shang-Chou Chang 張慎周 2014 學位論文 ; thesis 67 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 崑山科技大學 === 電機工程研究所 === 102 === This work applied one in-line sputtering tool to deposit indium tin oxide (ITO) films.The ITO films were following annealed in vacuum with low-heating rate of 10℃/min or traditional heating rate of 18℃～25℃/min. Structural, electrical and optical properties of ITO films vacuum annealed with low-heating rate or traditional heating rate were compared. The results indicate electrical and optical properties of ITO films vacuum annealed with low-heating rate are better than those with traditional heating rate. The ITO films vacuum annealed at 500oC with low-heating rate can have electric resistivity of 2.40×10-4Ω-cm and average optical transmittance in visible wavelength region of 93.10%.
author2 Shang-Chou Chang
author_facet Shang-Chou Chang
Chih-Yi Chien
簡志頤
author Chih-Yi Chien
簡志頤
spellingShingle Chih-Yi Chien
簡志頤
Low-heating-rate Annealing in Improving Electrical and Optical Properties of In-line Sputtered Indium Tin Oxide films
author_sort Chih-Yi Chien
title Low-heating-rate Annealing in Improving Electrical and Optical Properties of In-line Sputtered Indium Tin Oxide films
title_short Low-heating-rate Annealing in Improving Electrical and Optical Properties of In-line Sputtered Indium Tin Oxide films
title_full Low-heating-rate Annealing in Improving Electrical and Optical Properties of In-line Sputtered Indium Tin Oxide films
title_fullStr Low-heating-rate Annealing in Improving Electrical and Optical Properties of In-line Sputtered Indium Tin Oxide films
title_full_unstemmed Low-heating-rate Annealing in Improving Electrical and Optical Properties of In-line Sputtered Indium Tin Oxide films
title_sort low-heating-rate annealing in improving electrical and optical properties of in-line sputtered indium tin oxide films
publishDate 2014
url http://ndltd.ncl.edu.tw/handle/24968349805525200763
work_keys_str_mv AT chihyichien lowheatingrateannealinginimprovingelectricalandopticalpropertiesofinlinesputteredindiumtinoxidefilms
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AT chihyichien dījiārèsùlǜtuìhuǒgǎishànzhíxiànshìliánxùjiàndùyǎnghuàyīnxībáomóguāngdiàntèxìng
AT jiǎnzhìyí dījiārèsùlǜtuìhuǒgǎishànzhíxiànshìliánxùjiàndùyǎnghuàyīnxībáomóguāngdiàntèxìng
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