| Summary: | 碩士 === 義守大學 === 電子工程學系 === 102 === Roughness treatment and antireflection coating on single crystal silicon solar cell are the main method to form the antireflective layer [1]. The solar energy is efficiency reduced the reflection by the surface roughness treatment which can improve optical absorption and then to enhance the conversion efficiency. In this study, the single crystal silicon structure had been used as substrate. The photoelectric properties on the silicon surface after roughness treatment process had been investigated. The simple process as nanometers Nickel film were deposited on the surface of single crystal silicon and annealed treatment by rapid thermal annealing. The nickel silicon compounds and surface roughness structure were formed. The best NiSi compounds antireflective structure had been designed by changing the layer thickness and thermal treatment parameters. The lower cost nickel was chosen to form a low electrical resistivity and stable compound structures after thermal treatment. Due to the better surface carrier transmission properties and nano compounds surface roughness, both will enhance the transfer efficiency of single crystal silicon solar cell. The best antireflective structure of nano nickel silicon compound is a hole-like structure on the surface , which has the reflectivity as 10%. Compare with the normal wet etching single silicon, the reflective reduced about 22%, and the conductive is enhanced by the formation of Ni-Si compound.
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