The Channel Design of Hot-Wall MOCVD Chamber

• Main Authors: Yi-Yang Liao, 廖以暘
• Other Authors: Ruey-Yih Tsai
• Format: Others
• Language: zh-TW
• Published: 2014
• Online Access: http://ndltd.ncl.edu.tw/handle/4e5nc8

碩士 === 中原大學 === 機械工程研究所 === 102 === The plug-flow is an ideal flow field in MOCVD chamber, but the temperature gradient between the susceptor and chamber is too large that vortex shows on the side of susceptor which decrease the unifomity of the film. If we can increase the temperature of chamber wall, the temperautre gradient between wall and susceptor will decrease. In this way, we will have better epitaxy qulity .In order to increase the wall temperature, we change the fluid of chamber channel for silicone oil which can take higher temperature. When the temperature of the fluid of chamber channel becomes higher, the temperature of chamber wall also becomes higher. This research uses Comsol Multiphysics software to do the thermal-flow field analysis of the chamber wall in three dimension. First, we put water in the different chamber wall channel, then we analyze which channel can get better uniformity of temperature. The result shows that the cross channel have the lowest temperature difference which is 0.5℃ on the chamber wall above the susceptor. Next, we put the silicone oil in the cross channel to replace the water. Finally, we observe the change of the temperature gradient on the chamber wall. It shows that the maximum of the wall temperature, above the susceptor, raised to 49.5℃、64℃、94℃, and the maximum wall temperature difference is 10℃、12℃、29℃, after we put 20℃、50℃、100℃ silicone oil in. Therefore, rising silicone oil temperature can increase the whole chamber wall temperature, but the temperature gradient will also rise, so the temperature uniformity and high wall temperature depend on how customers need.