Properties of Cu Thin Films Grown by Sputter Deposition and Molecular Beam Epitaxy
碩士 === 國立中正大學 === 物理學系暨研究所 === 102 === Copper thin films have been grown on glass substrates by DC diode planar sputter and molecular beam epitaxy (MBE). The as-grown Cu films have been examined by atomic force microscopy. A positive correlation between the roughness and the thickness of thin Cu fil...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/4h636g |
| Summary: | 碩士 === 國立中正大學 === 物理學系暨研究所 === 102 === Copper thin films have been grown on glass substrates by DC diode planar sputter and molecular beam epitaxy (MBE). The as-grown Cu films have been examined by atomic force microscopy. A positive correlation between the roughness and the thickness of thin Cu films is observed. On the other hand, real-time resistivity measurements of Cu films grown by MBE via Van der Pauw method reveal a dependence of resistivity on the film thickness. This dependence is then compared to known results predicted by theoretical models and from experimental data.
|
|---|