A Study on the Electrostatic Field-assisted Electrodeposition of Micropatterned Prussian Blue Thin Films

碩士 === 淡江大學 === 化學工程與材料工程學系碩士班 === 101 === Micropatterns have been extensively used in many research and application aspects, such as solar cells, sensors, and light emitting devices, etc.. Methods of photoresist lithography, soft lithography, reactive wet stamping, templating, or aqueous chemical g...

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Bibliographic Details
Main Authors: Kuen-Yi Ding, 丁坤億
Other Authors: Cheng-Lan Lin
Format: Others
Language:zh-TW
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/88480789587014364073
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Summary:碩士 === 淡江大學 === 化學工程與材料工程學系碩士班 === 101 === Micropatterns have been extensively used in many research and application aspects, such as solar cells, sensors, and light emitting devices, etc.. Methods of photoresist lithography, soft lithography, reactive wet stamping, templating, or aqueous chemical growth are commonly employed to prepare micropatterns. These procedures usually consist of multiple steps and are relatively complicate. In this study, a new approach to create micropatterns on conducting plastic substrate is proposed. An electrostatic film with micropatterns (Micropatterned polyacrylate/polyethylene, MPA/PE) is firstly attached onto the conductive side of an ITO/PET conducting substrate. The electrostatic field exhibited between the micropatterned electrostatic film and PET will induced an uneven surface potential distribution on the ITO surface. After the electrostatic film is removed, the remaining surface potential difference might alter the electrodeposition rate of Prussian Blue (PB) at different location on the ITO surface, and thus leading to the formation of a micropatterned PB thin film. This method might find its potential appliactions in preparing micropatterns on conducting substrates. In order to understand the corresponding polarity of charge between Micropatterned polyacrylate/polyethylene and ITO/PET during contact, the functional group of polyacrylic resin / PE of surface is an effective factor. The functional group of selective area is measured by Microscopes Raman Spectrometer. And the functional group of contact surfacre is measured by Fourier transform infrared spectroscopy-Attenuated Total Reflectance. The result of spectrum found that the electrostatic film of contact side possess oxygen-containing functional group. This material tends toward postive charge when it contacts with other substance. The misropattern of Prussian Blue thin film is prepared by potentiostatic method. In comparison, two types of working electrodes show different i-t curve during electrodepostion. One of these working electrodes is attached by electrostatic film, and the other one is not. Experiment is executed by constant potential for same time. Observed that i-t curves response, and determined how long of deposition time can obtain more better selectiveness of micropattern of Prussian blue . The misropattern of Prussian Blue thin film prepare by pulse plating method. Observed the initial current density of i-t curves of two types of working electrodes under potentiostatic experiment, and determined what range of Ed can obtain the best micropattern of Prussian Blue. The resultant micropattern of Prussian Blue have been characterized by means of Optical microscope (OM), Scanning Electron Microscope (SEM) and Surfcorder analysis. The selectivity of micropattern defined formula as ∆T/Tt×100%, where Tt is thickness of Prussian Blue film, ∆T is concave micropattern of height. For the potentiostatic deposition condition, the selectivity of micropattern decreased with the deposition time increaseing. Because the growing process of PB film, from dynamic comtrol change to diffuse control. It caused the effect of electrostatic field decrease when electrodeposition executed. Therefore if the selectiveness want to achieve more better, plating time must be controled in a short time. For example, plated under 0.65V and controled deposition time below 15s, then it can obtain micropattern with selectivity as high as 94.14%. Under the pluse plating system, Electrodeposition cyclig 15000 times with Er=0.90V、Ed=0.05V 、tr and td which are both 0.01s obtain film reaching 2 μm and selectiveness reaching to 92.66%. This resultant sucessfully overcome that long time Electrodeposition can not obtain micropattern of great selectiveness by potentiostatic.