Simplified thin film design for transmission type and reflection type achromatic waveplates
碩士 === 國立臺北科技大學 === 光電工程系研究所 === 101 === In this study, transparent-type and reflective-type achromatic waveplate are designed by a symmetrical film stack. The structure of transparent-type achromatic waveplate is (ABA)n, and the structure of reflective-type achromatic waveplate is (index matching l...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/463t5y |
| Summary: | 碩士 === 國立臺北科技大學 === 光電工程系研究所 === 101 === In this study, transparent-type and reflective-type achromatic waveplate are designed by a symmetrical film stack. The structure of transparent-type achromatic waveplate is (ABA)n, and the structure of reflective-type achromatic waveplate is (index matching layers (IMLs)/(ABA)n/Ag). A and B are thin films of different index.
The number of thin film layers of transparent-type achromatic waveplate can be simplified by arranging a high-index contrast of layers A and B in this study. The number of layers is 13 layers. Birefringence and high contrast of refractive index are investigated for transparent-type achromatic waveplate.
Reflective-type achromatic waveplate is designed by the structure (IMLs)/(ABA)n/Ag). IMLs is very important for the design. The material of the IMLs is selected according to the equivalent refractive index E of symmetrical thin film stack in the passband. The symmetrical film stack(ABA) comprises at least one anisotropic thin film. Additionally, selecting the birefringence and thickness of the thin film allows for the design of uniform phase retardation in both the passband and stopband.
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