A Study on The Preparation of A Surface-Textured Amorphous Titanium Oxide Thin Film by Twice Deposition Method and Its Photocatalytic Activity
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 101 === In this study, an amorphous titanium oxide thin film was prepared plasma enhanced chemical vapor deposition(PECVD) at a substrate temperature of 150 ℃ using titanium- tetraisopropoxide(TTIP) and oxygen as source material. Surface-textured TiOx base layer wa...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/kfed93 |