Fabrication and Characterization of Nanopore Devices and Iron Nitride Thin Films

碩士 === 國立臺灣大學 === 物理研究所 === 101 === The magnetic tunnelling junction (MTJ) is a sandwiched structure, with //ferromagnetic layer 1 (FM1)/tunnelling barrier (insulator, organic material... etc)/ferromagnetic layer 2 (FM2)//. In MTJs, a pinhole phenomenon may take place in the thin film layer, which i...

Full description

Bibliographic Details
Main Authors: Chia-Nan Yen, 顏嘉男
Other Authors: Minn-Tsong Lin
Format: Others
Language:en_US
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/10660486252651514553
id ndltd-TW-101NTU05198017
record_format oai_dc
spelling ndltd-TW-101NTU051980172016-03-16T04:15:06Z http://ndltd.ncl.edu.tw/handle/10660486252651514553 Fabrication and Characterization of Nanopore Devices and Iron Nitride Thin Films 奈米孔洞元件與鐵氮薄膜的製備與性質 Chia-Nan Yen 顏嘉男 碩士 國立臺灣大學 物理研究所 101 The magnetic tunnelling junction (MTJ) is a sandwiched structure, with //ferromagnetic layer 1 (FM1)/tunnelling barrier (insulator, organic material... etc)/ferromagnetic layer 2 (FM2)//. In MTJs, a pinhole phenomenon may take place in the thin film layer, which is only a few nanometers thick and may be penetrated by other layers, and the pinhole may cause a short circuit. There are many factors influencing the probability of the pinhole, for example: the junction area, growth temperature, deposition pressure and material growth methods and so on. To reduce the problem of pinhole, we adopt nanopore fabrication, which uses electron-beam lithography and the reactive-ion etching method to create a nano-scale bowl-shaped pore with a volcano shaped gate electrode on a 30nm-thick silicon nitride (Si$_{3}$N$_{4}$) membrane. As compare to previous MTJ device, the nanopore type devices still have some transport mechanisms to study. Giant saturation magnetization (M$_{s}$) materials are used widely in the modern magnetic recording industry and are playing more and more important roles. The well known giant saturation magnetization material Fe$_{65}$Co$_{35}$ alloy can reach 1950 emu/cm$^{3}$. But in recent studies, it has been shown that iron nitride thin films can reach higher saturation magnetization than Fe$_{65}$Co$_{35}$. In this thesis, the iron nitride thin films in bct structure, which may possess high saturation magnetization phase Fe$_{16}$N$_{2}$/ Fe$_{8}$N, are fabricated on GaAs (001) single crystal substrates, buffered by Au (001), which was chosen due to its small lattice mismatch, by reactive DC magnetron sputtering. Different phases of iron nitride were observed by controlling the mixture ratio of Ar and N$_{2}$ in different growth temperature and in-situ post-annealing process. Vibrating sample magnetometer (VSM) and grazing incidence x-ray diffraction (GIXRD) carry out measurements of the magnetic properties and the crystalline structure, and in turn provide a important correlation between magnetism and crystalline structure of FeN system. Minn-Tsong Lin 林敏聰 2013 學位論文 ; thesis 46 en_US
collection NDLTD
language en_US
format Others
sources NDLTD
description 碩士 === 國立臺灣大學 === 物理研究所 === 101 === The magnetic tunnelling junction (MTJ) is a sandwiched structure, with //ferromagnetic layer 1 (FM1)/tunnelling barrier (insulator, organic material... etc)/ferromagnetic layer 2 (FM2)//. In MTJs, a pinhole phenomenon may take place in the thin film layer, which is only a few nanometers thick and may be penetrated by other layers, and the pinhole may cause a short circuit. There are many factors influencing the probability of the pinhole, for example: the junction area, growth temperature, deposition pressure and material growth methods and so on. To reduce the problem of pinhole, we adopt nanopore fabrication, which uses electron-beam lithography and the reactive-ion etching method to create a nano-scale bowl-shaped pore with a volcano shaped gate electrode on a 30nm-thick silicon nitride (Si$_{3}$N$_{4}$) membrane. As compare to previous MTJ device, the nanopore type devices still have some transport mechanisms to study. Giant saturation magnetization (M$_{s}$) materials are used widely in the modern magnetic recording industry and are playing more and more important roles. The well known giant saturation magnetization material Fe$_{65}$Co$_{35}$ alloy can reach 1950 emu/cm$^{3}$. But in recent studies, it has been shown that iron nitride thin films can reach higher saturation magnetization than Fe$_{65}$Co$_{35}$. In this thesis, the iron nitride thin films in bct structure, which may possess high saturation magnetization phase Fe$_{16}$N$_{2}$/ Fe$_{8}$N, are fabricated on GaAs (001) single crystal substrates, buffered by Au (001), which was chosen due to its small lattice mismatch, by reactive DC magnetron sputtering. Different phases of iron nitride were observed by controlling the mixture ratio of Ar and N$_{2}$ in different growth temperature and in-situ post-annealing process. Vibrating sample magnetometer (VSM) and grazing incidence x-ray diffraction (GIXRD) carry out measurements of the magnetic properties and the crystalline structure, and in turn provide a important correlation between magnetism and crystalline structure of FeN system.
author2 Minn-Tsong Lin
author_facet Minn-Tsong Lin
Chia-Nan Yen
顏嘉男
author Chia-Nan Yen
顏嘉男
spellingShingle Chia-Nan Yen
顏嘉男
Fabrication and Characterization of Nanopore Devices and Iron Nitride Thin Films
author_sort Chia-Nan Yen
title Fabrication and Characterization of Nanopore Devices and Iron Nitride Thin Films
title_short Fabrication and Characterization of Nanopore Devices and Iron Nitride Thin Films
title_full Fabrication and Characterization of Nanopore Devices and Iron Nitride Thin Films
title_fullStr Fabrication and Characterization of Nanopore Devices and Iron Nitride Thin Films
title_full_unstemmed Fabrication and Characterization of Nanopore Devices and Iron Nitride Thin Films
title_sort fabrication and characterization of nanopore devices and iron nitride thin films
publishDate 2013
url http://ndltd.ncl.edu.tw/handle/10660486252651514553
work_keys_str_mv AT chiananyen fabricationandcharacterizationofnanoporedevicesandironnitridethinfilms
AT yánjiānán fabricationandcharacterizationofnanoporedevicesandironnitridethinfilms
AT chiananyen nàimǐkǒngdòngyuánjiànyǔtiědànbáomódezhìbèiyǔxìngzhì
AT yánjiānán nàimǐkǒngdòngyuánjiànyǔtiědànbáomódezhìbèiyǔxìngzhì
_version_ 1718206282208378880