Optical properties of InGaN and MgZnO films

碩士 === 國立臺灣海洋大學 === 光電科學研究所 === 101 === In this thesis, we use the photoluminescence (PL) measurement to study the optical properties of InxGa1-xN epitaxial layers ( x = 0.020, 0.040, 0.110, 0.150, 0.300 and 0.330) grown by metalorganic chemical vapor deposition ( MOCVD ) and MgxZn1-xO epitaxial lay...

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Bibliographic Details
Main Authors: Li-Yun Lin, 林立雲
Format: Others
Language:zh-TW
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/14086289927073082802
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Summary:碩士 === 國立臺灣海洋大學 === 光電科學研究所 === 101 === In this thesis, we use the photoluminescence (PL) measurement to study the optical properties of InxGa1-xN epitaxial layers ( x = 0.020, 0.040, 0.110, 0.150, 0.300 and 0.330) grown by metalorganic chemical vapor deposition ( MOCVD ) and MgxZn1-xO epitaxial layers ( x = 0.033, 0.064, 0.083 and 0.112) grown by molecular beam epitaxy ( MBE ), respectively. We observe that the full width at half maximum (FWHM) of the PL of the InxGa1-xN and MgxZn1-xO layers increased with increasing indium and magnesium contents, respectively. To further investigate the measured results, the data were analyzed by curve fittings with Schubert’s theoretical calculations. The results of temperature-dependent PL measurements reveal that, with higher x content in the InxGa1-xN and MgxZn1-xO epitaxial layers, the PL peak energy exhibits the significant S-shape with increasing temperature due to compositional fluctuation and inhomogeneous distribution in the InxGa1-xN and MgxZn1-xO epitaxial layers.