Preparation and Optical Characterization of Nanostructures on Silicon Wafer and ZnO Films

碩士 === 國立臺南大學 === 材料科學系碩士班 === 101 === Low conversion efficiency is still the main limiting factor for current solar cells. Most of the energy loss during solar cell operation is attributed to light reflection. To reduce the light reflection, we can change the path of light entering the solar-cell....

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Main Authors: Ming-lun Wu, 吳明崙
Other Authors: Ing-Chi Leu
Format: Others
Language:zh-TW
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/34962665205125316068
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spelling ndltd-TW-101NTNT51590012015-10-13T22:01:30Z http://ndltd.ncl.edu.tw/handle/34962665205125316068 Preparation and Optical Characterization of Nanostructures on Silicon Wafer and ZnO Films 矽晶圓及氧化鋅薄膜上奈米結構的製作及光學性質分析 Ming-lun Wu 吳明崙 碩士 國立臺南大學 材料科學系碩士班 101 Low conversion efficiency is still the main limiting factor for current solar cells. Most of the energy loss during solar cell operation is attributed to light reflection. To reduce the light reflection, we can change the path of light entering the solar-cell. In addition, to increase the energy conversion efficiency, light trapping is a key point to the cell structure. We can increase light trapping by a textured transparent conduction oxide (TCO) layer. Because the textured films can enhance the light trapping, the textured TCO films can get thinner compared with the thicker flat films. There are two parts in this study. First, we etched the pyramidal structure on silicon wafer to get the hierarchical structure by an electroless metal deposition-assisted etching method. We changed the Ag deposition time, etching temperature, HF concentration, H2O2 concentration and etching time, and discussed the influence of the different parameters on the structure and optical properties of the silicon wafer. Second, we used a sol-gel method to get the textured ZnO films. We changed sol-gel concentration, different preheat temperature, different heat treatment temperature, to discuss the influence of different parameter on the preparation of wrinkles films. Then we got high transmittance, high haze, low resistivity by coating FTO films on ZnO films. We showed the lowest reflectance about 1.7 % at wavelength 550 nm by moderating the H2O2 concentration during Si etching. By changing zinc oxide concentration, we showed the best result of about 72.2 % haze, 83 % transmittance and sheet resistance 44 Ω/□. ZnO wrinkles will be impressed by the doping of Al and their dimensions get flatter, resulting the ZnO films with a lower haze. Ing-Chi Leu 呂英治 2013 學位論文 ; thesis 81 zh-TW
collection NDLTD
language zh-TW
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description 碩士 === 國立臺南大學 === 材料科學系碩士班 === 101 === Low conversion efficiency is still the main limiting factor for current solar cells. Most of the energy loss during solar cell operation is attributed to light reflection. To reduce the light reflection, we can change the path of light entering the solar-cell. In addition, to increase the energy conversion efficiency, light trapping is a key point to the cell structure. We can increase light trapping by a textured transparent conduction oxide (TCO) layer. Because the textured films can enhance the light trapping, the textured TCO films can get thinner compared with the thicker flat films. There are two parts in this study. First, we etched the pyramidal structure on silicon wafer to get the hierarchical structure by an electroless metal deposition-assisted etching method. We changed the Ag deposition time, etching temperature, HF concentration, H2O2 concentration and etching time, and discussed the influence of the different parameters on the structure and optical properties of the silicon wafer. Second, we used a sol-gel method to get the textured ZnO films. We changed sol-gel concentration, different preheat temperature, different heat treatment temperature, to discuss the influence of different parameter on the preparation of wrinkles films. Then we got high transmittance, high haze, low resistivity by coating FTO films on ZnO films. We showed the lowest reflectance about 1.7 % at wavelength 550 nm by moderating the H2O2 concentration during Si etching. By changing zinc oxide concentration, we showed the best result of about 72.2 % haze, 83 % transmittance and sheet resistance 44 Ω/□. ZnO wrinkles will be impressed by the doping of Al and their dimensions get flatter, resulting the ZnO films with a lower haze.
author2 Ing-Chi Leu
author_facet Ing-Chi Leu
Ming-lun Wu
吳明崙
author Ming-lun Wu
吳明崙
spellingShingle Ming-lun Wu
吳明崙
Preparation and Optical Characterization of Nanostructures on Silicon Wafer and ZnO Films
author_sort Ming-lun Wu
title Preparation and Optical Characterization of Nanostructures on Silicon Wafer and ZnO Films
title_short Preparation and Optical Characterization of Nanostructures on Silicon Wafer and ZnO Films
title_full Preparation and Optical Characterization of Nanostructures on Silicon Wafer and ZnO Films
title_fullStr Preparation and Optical Characterization of Nanostructures on Silicon Wafer and ZnO Films
title_full_unstemmed Preparation and Optical Characterization of Nanostructures on Silicon Wafer and ZnO Films
title_sort preparation and optical characterization of nanostructures on silicon wafer and zno films
publishDate 2013
url http://ndltd.ncl.edu.tw/handle/34962665205125316068
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