High Temperature Treatment and Post-Annealing Regrowth of Interfacial Layer on Electrical and Material Characteristics in MOS Devies
碩士 === 國立清華大學 === 工程與系統科學系 === 101
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/94938537217697534156 |