A More Accurate and High Voltage Real-time Capacitor Monitor Circuit for Potential TDDB Testing
碩士 === 國立清華大學 === 電子工程研究所 === 101 === The interconnect line width and spacing shrink with advanced technology. The reduction in line space increases the electric field in the dielectric between metal lines. Thus, time dependent dielectric breakdown (TDDB) needs to be investigated and resolved before...
Main Authors: | Chou, Tsung-Hsing, 周宗興 |
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Other Authors: | Chang, Mi-Chang |
Format: | Others |
Language: | en_US |
Published: |
2013
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Online Access: | http://ndltd.ncl.edu.tw/handle/69167503869675779681 |
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