A More Accurate and High Voltage Real-time Capacitor Monitor Circuit for Potential TDDB Testing

碩士 === 國立清華大學 === 電子工程研究所 === 101 === The interconnect line width and spacing shrink with advanced technology. The reduction in line space increases the electric field in the dielectric between metal lines. Thus, time dependent dielectric breakdown (TDDB) needs to be investigated and resolved before...

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Bibliographic Details
Main Authors: Chou, Tsung-Hsing, 周宗興
Other Authors: Chang, Mi-Chang
Format: Others
Language:en_US
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/69167503869675779681

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