| Summary: | 碩士 === 國立中山大學 === 環境工程研究所 === 101 === In this study, emission concentrations of volatile organic pollutants (VOCs) and inorganic acid-basis gases were measured in a semiconductor factory in Houli Central Taiwan Science Park (CTSP). The Gaussian diffusion model was used to evaluate the impact of emitted pollutants on the ambient air.
Measured results show that emission concentration of VOCs from zeolite rotor concentrator tubes was 151.4 ppb; whereas emission concentration of VOCs from regenerative thermal oxidizer was 3975.2 ppb. The aromatic hydrocarbons contributed the highest portion of OFP (ozone formation potential) were 71.2 % 、47.3 % respectively. Respect of species, the toluene were 39.5 %、41.5 % respectively. For inorganic acid, emission concentration of H2SO4 was the highest (193 – 513 g/Nm3), followed by the concentration of HNO3. The HCl emission factor was the highest in the acid gas. Also, the emission concentration of NH3 was 3.87 ppm from the concentrationn tubes.
Simulation results show that the maximum ground-level concentration of VOCs was 22.0 ppb at a 50 m downwind site. When the pollutants dispersed to outside the park, the concentrations were reduced to below 10 ppb. Also, the maximum ground-level concentrations of sulfuric acid, nitric acid, hydrochloric acid, hydrofluoric acid and phosphoric acid were 0.94,0.77,0.89,1.05, and 0.16 g/Nm3 respectively, all close to a 50 m downwind site. Thus, the impact of air pollutants to the ambient air was negligible.
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