Improving Particle Defect at TEOS Process of Semiconductor Manufacturing Technology
碩士 === 國立高雄海洋科技大學 === 微電子工程研究所 === 101 === Diffusion technology is widely used in the semiconductor industry and precision machinery, due to the use of diffusion technology products with high added value, the diffusion techniques and materials are widely used in research and practice, however, the y...
Main Authors: | P.-K. Su, 蘇柏昆 |
---|---|
Other Authors: | S.-H. Chang |
Format: | Others |
Language: | zh-TW |
Published: |
2013
|
Online Access: | http://ndltd.ncl.edu.tw/handle/58471274051793824631 |
Similar Items
-
Kernel-Density-Based Particle Defect Management for Semiconductor Manufacturing Facilities
by: Seung Hwan Park, et al.
Published: (2018-02-01) -
Analysis of wafer defects and improvement in semiconductor processing
by: Yi-Feng Tsai, et al.
Published: (2011) -
Application of QC Story to Improve Particles Defect inSemiconductor Equipment
by: Meng-JuTsai, et al.
Published: (2012) -
To Explore the Semiconductor Equipment’s Manufacturing Process Defects Using the TRIZ Method
by: Ming-HungWu, et al.
Published: (2013) -
A Study of Particles and Defects from Semiconductor Discussion Furnace Process
by: Fu-lien Tang, et al.
Published: (2016)