Yield-Enhancement Techniques forProjected Capacitive Touch Panels

• Main Authors: Wei-Hsun Liao, 廖偉勛
• Other Authors: Jin-Fu Li
• Format: Others
• Language: zh-TW
• Published: 2013
• Online Access: http://ndltd.ncl.edu.tw/handle/02845193129909307766

碩士 === 國立中央大學 === 電機工程學系在職專班 === 101 === With the rapid development of touch panel technology, the design and process technologies of touch panel circuitry have become the keys to production yield rate and manufacturing cost. In this thesis the plans for compensation design and process improvement have been proposed with respect to the photomask design and process technology of metal jumper wires of projected capacitive touch panel. A PI (passivation insulator) half-tone photomask design will be proposed in the first section to avoid scratched or broken metal jumper wires. The widths and pitches of photomask patterns will be adjusted to allow sufficient exposure light to penetrate through the photomask and to result in PI trenches with different widths and depths on the PI pattern. In the second section, a plan for improving the production yield rate of metal jumper wires will be proposed by incorporating OPC (optical proximity correction) on the metal jumper wire photomask to compensate the metal jumper wire CD (critical dimension) loss. Utilizing over-exposure and over-development fabrication processes, the conductive metal jumper wire can be embedded into the protective PI layers in order to reduce the loss of production yield rate due to wire scratch damage and breakage during the manufacturing process. With this method the production yield rate of the metal jumper wires can be improved, and the R&D costs can be reduced in order to achieve the rapid mass production and cost reduction of such product.