Simulations of Flow Field in a Wafer-Etching Tank
碩士 === 國立交通大學 === 機械工程系所 === 101
Main Authors: | Wu, Kai-Chun, 吳開俊 |
---|---|
Other Authors: | Chen, Ching-Yao |
Format: | Others |
Language: | zh-TW |
Published: |
2013
|
Online Access: | http://ndltd.ncl.edu.tw/handle/92492424458468230251 |
Similar Items
-
Numerical simulation on the plasma flow for the wafer holder at various rotational speeds in the etching process
by: Kai-Ying Chen, et al.
Published: (2015) -
Flow Field Analysis of Wet Bench Tank Coating for 200mm Wafer
by: Wang , JrWen, et al.
Published: (2002) -
Etching performance of silicon wafers with redesigned etching drum
by: Dolah, Rozzeta
Published: (2006) -
Application ensemble method for wafer classification in semiconductor etching process
by: Kai-Chun Hsiao, et al.
Published: (2019) -
The study on the improvement of wafer etching uniformity
by: TAI,CHIH-CHENG, et al.
Published: (2016)