Investigation and Comparison of Work Function Variation for FinFET and UTB SOI Devices using Voronoi Approach
碩士 === 國立交通大學 === 電子研究所 === 101 === Using a novel Voronoi simulation method that can physically and efficiently consider the interaction between neighboring grains, this thesis investigates and compares the impact of work function variation (WFV) on FinFET and Ultra-Thin-Body (UTB) SOI devices. Our...
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| Format: | Others |
| Language: | en_US |
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2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/49832511429474985972 |