Balancing Mask Density on Triple Patterning Lithography Aware Gridless Detailed Routing
碩士 === 國立交通大學 === 資訊科學與工程研究所 === 101 === For the sub-14nm technology node, triple patterning lithography (TPL) is adopted, which decomposes a single layer into three masks to increase pitch and enhance the resolution. In routing stage, considering TPL can improve the flexibility of layout decomposit...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/64569855320346299132 |