Adsorption and Reaction of 2,3-dibromopyridine on Cu(100)

碩士 === 國立成功大學 === 化學系碩博士班 === 101 === The adsorption and thermal reactions of 2,3-dibromopyridine on Cu(100) in ultra-high vacuum system have been studied using the surface techniques of temperature-programmed reaction/desorption (TPR/D), x-ray photoelectron spectrocopy (XPS) and near edge x-ray ab...

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Main Authors: Bo-ChiuanLin, 林柏全
Other Authors: Jong-Liang Lin
Format: Others
Language:zh-TW
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/scv749
id ndltd-TW-101NCKU5065084
record_format oai_dc
spelling ndltd-TW-101NCKU50650842018-06-25T06:06:42Z http://ndltd.ncl.edu.tw/handle/scv749 Adsorption and Reaction of 2,3-dibromopyridine on Cu(100) 2,3-二溴吡啶在銅(100)表面上的吸附與反應研究 Bo-ChiuanLin 林柏全 碩士 國立成功大學 化學系碩博士班 101 The adsorption and thermal reactions of 2,3-dibromopyridine on Cu(100) in ultra-high vacuum system have been studied using the surface techniques of temperature-programmed reaction/desorption (TPR/D), x-ray photoelectron spectrocopy (XPS) and near edge x-ray absorption fine structure (NEXAFS). The TPR/D study shows that the molecular desorption from the multilayer amd monolayer occurs at 270 K and 220 K. The XPS evidence reveals the stepwise C-Brdisoociation of C5NBr2H3→C5NBrH3→C5NH3. The C-Br bond of C5NBr2H3 can be broken at 110 K, but is completed prior to 400 K. The C5NH3 is stable upto 480 K and then dissociates by C-H scission. Thermal decomposition of C5NH3 causes the desorption of H2 (650 K), HCN (676 K, 872 K), HBr (686 K) and C2N2 (842 K). NEXAFS suggests that the angle between the aromatic plane of C5NBr2H3,C5NBrH3 or C5NH3 and the copper surface is at 45-55o. Jong-Liang Lin 林榮良 2013 學位論文 ; thesis 55 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立成功大學 === 化學系碩博士班 === 101 === The adsorption and thermal reactions of 2,3-dibromopyridine on Cu(100) in ultra-high vacuum system have been studied using the surface techniques of temperature-programmed reaction/desorption (TPR/D), x-ray photoelectron spectrocopy (XPS) and near edge x-ray absorption fine structure (NEXAFS). The TPR/D study shows that the molecular desorption from the multilayer amd monolayer occurs at 270 K and 220 K. The XPS evidence reveals the stepwise C-Brdisoociation of C5NBr2H3→C5NBrH3→C5NH3. The C-Br bond of C5NBr2H3 can be broken at 110 K, but is completed prior to 400 K. The C5NH3 is stable upto 480 K and then dissociates by C-H scission. Thermal decomposition of C5NH3 causes the desorption of H2 (650 K), HCN (676 K, 872 K), HBr (686 K) and C2N2 (842 K). NEXAFS suggests that the angle between the aromatic plane of C5NBr2H3,C5NBrH3 or C5NH3 and the copper surface is at 45-55o.
author2 Jong-Liang Lin
author_facet Jong-Liang Lin
Bo-ChiuanLin
林柏全
author Bo-ChiuanLin
林柏全
spellingShingle Bo-ChiuanLin
林柏全
Adsorption and Reaction of 2,3-dibromopyridine on Cu(100)
author_sort Bo-ChiuanLin
title Adsorption and Reaction of 2,3-dibromopyridine on Cu(100)
title_short Adsorption and Reaction of 2,3-dibromopyridine on Cu(100)
title_full Adsorption and Reaction of 2,3-dibromopyridine on Cu(100)
title_fullStr Adsorption and Reaction of 2,3-dibromopyridine on Cu(100)
title_full_unstemmed Adsorption and Reaction of 2,3-dibromopyridine on Cu(100)
title_sort adsorption and reaction of 2,3-dibromopyridine on cu(100)
publishDate 2013
url http://ndltd.ncl.edu.tw/handle/scv749
work_keys_str_mv AT bochiuanlin adsorptionandreactionof23dibromopyridineoncu100
AT línbǎiquán adsorptionandreactionof23dibromopyridineoncu100
AT bochiuanlin 23èrxiùbǐdìngzàitóng100biǎomiànshàngdexīfùyǔfǎnyīngyánjiū
AT línbǎiquán 23èrxiùbǐdìngzàitóng100biǎomiànshàngdexīfùyǔfǎnyīngyánjiū
_version_ 1718706493540270080