| Summary: | 碩士 === 國立勤益科技大學 === 研發科技與資訊管理研究所 === 101 === In recent years, with the booming development in optoelectronic, semiconductor and biotech, a substantial has increased in the demand for valve products, followed by significantly needs in the precision of products. The valve products reaching the standard of fire-resistant, explosion-proof, corrosion-resistant, high temperature and high pressure leads to the continuing valve industry investment in research on development and process refinement.
In the process of Optoelectronic, semiconductor manufacturing, the toxic but clean liquid and gas process are conveyed through ultra-clean valve, provided for the use of cleaning and chemical processing. Chemical changes which of air or liquid remaining in the path result in risk. The control of surface roughness will effectively improve the residual problems, and is conducive to the cleaning valve parts in the production process.
The research applies Six Sigma methods in the ultra-clean Valve industry and find out the vital factor by Taguchi method, which comes up effectiveness in processing while processing. The best optimum parameter conducted to refinement by Taguchi method leads to the effective progress in Process Capability Index, the refinement in surface roughness during procedure, the stability in processing quality, enhance in ultra-clean valve product, much competitive in process and the index example for the field.
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