| Summary: | 博士 === 國立中興大學 === 精密工程學系所 === 101 === This study develops an asymmetric microlens array process applied to light-control films, through the lateral light collecting efficiency of liquid crystal displays can be enhanced and the glare issue generated in the viewing angle can be improved. The study proposed three different processes to produce the asymmetric microlens array, among which the first process adopts the lift-off method to form a raised or sunken copper based film on the wafer, then after the photoresist coating and exposure with the way of mask qlignment is done. Finally, the circular columns of photoresist are formed on the base after development. The copper metal film is used to change the contact area and contact pattern between the liquid photoresist and the base after the photoresist is fully melted, and then further change the liquid photoresist surface tension . After the wafer is face-down, laced and inclined, when the photoresist is melted, the copper film base can accurately control the bottom shape of the liquid photoresist. In addition, it can effectively prevent the liquid photoresist slippage, through which a high and small-radius-of-curvature asymmetric micro-lens array can be produced. The second process utilizes the oblique exposure and the developing method to produce an oblique photoresist column array with circular cross sections on the wafer, and then the wafer is face-down placed and inclined to produce an asymmetric micro-lens array through the incomplete melt method and the gravitational effect. The third process uses the lithography process and lift-off method firstly to prepare the first layer of metal columns, and then the second lithography is used to cover the photoresist on the first layer of metal columns through offset alignment exposure method. Since the hydrophobicity of the metal columns is greater than the base, the photoresist on the metal column will bulge to make it form an asymmetric microlens array in the melting process. These three processes can be used to produce the asymmetric lens array. However, the first process can produce the asymmetric micro-lens array with an offset angle of up to 55 °.
|
|---|
