Optical Design and Simulation of High-Performance UV LED Exposure System

• Main Authors: Wei-Ting Fu, 傅偉庭
• Other Authors: Pin Han
• Format: Others
• Language: zh-TW
• Published: 2013
• Online Access: http://ndltd.ncl.edu.tw/handle/31380920766114330886

碩士 === 國立中興大學 === 精密工程學系所 === 101 === The developed nations lately emphasize the concepts of energy saving and environmental protection; therefore LED gains much attention due to its advantages, such as no mercury pollution and low power consumption. Still the key issue is to improve the lighting efficiency. Exposure technology has been developed more than 30 years in the semiconductor industry. It is the most extensive technology at present, but it is also a target to be strongly developed around the world. However, the development is relatively weak in our country, and most of them are still using the traditional high-pressure mercury lamp as the light source Furthermore, the traditional high-pressure mercury lamp has many disadvantages as the following: wide wavelength range, the long start-up time, energy consumption and high cost ... etc. To solve these problems, this paper put forward an optical design that uses the UV LED as the light source, expressly stipulate the utilization rate of light, uniformity, size and working distance. Through this study, we could thoroughly understand the relationship and influence of the parameters of optical elements in this exposure system. we successfully achieved less than 2% of the nonuniformity and light utilization rate of 40%.