| Summary: | 碩士 === 明新科技大學 === 電機工程研究所碩士在職專班 === 101 === Transparent conducting indium tin oxide (ITO) thin film were deposited onto
blank galss by DC magnetron sputtering for touch panel products. Via the change of
the process parameter for example：substrate temperature,oxygen pressure,working
pressure......to study resistiveity、transmittance and thickness of thin-film properties.
Transparent conducting thin film is semiconductor on electrical properties,it is also
easy to show the wards and photo, usually apply to touch panel need highly visible
transmission, so the film thickness needs to be very thin, however this has many
disadvantages, including unstable electrical properties, non-uniform sheet resistance.
Except improve ITO thin-film properties,we also try to find the optimal process
parameter for a factory.
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