Study on the plasma characterization for metal target and the properties of TiN coating by high power impulsed magnetron sputtering
碩士 === 明道大學 === 材料科學與工程學系碩士班 === 101 === High power impulse magnetron sputtering (HiPIMS) is one of the latest coating technology. A pulsed power with low duty cycle is used to generate the plasma to having a plasma concentrations up to 1019/m3 and an ionization rate of 69 to 99%. In this study, T...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/54034362867266766868 |