Switching mechanism transition induced by annealing treatment in Pt/ZnO/Cr/ZnO/Pt resistive memory
碩士 === 長庚大學 === 電子工程學系 === 101 === In this study, ZnO thin film embedding a Cr metal layer with Pt electrodes were prepared for nonvolatile resistive memory applications. By modifying the Cr thickness and annealing temperature of the device, the memory cell not only exhibits reversible and steady b...
Main Authors: | Keng Hao Liu, 劉耿豪 |
---|---|
Other Authors: | S. L. Kao |
Format: | Others |
Published: |
2012
|
Online Access: | http://ndltd.ncl.edu.tw/handle/09962219134105447200 |
Similar Items
-
Optimization of resistive switching characteristics of Pt/ZnO/Pt memory cells by cobalt doping
by: Nguyen, Hung-Cuong, et al.
Published: (2012) -
Effect of FePt/ZnO heterojunction on resistive switching behavior
by: Bo-Hong Jhuo, et al. -
Optical Properties of Nanoheterostructures of ZnO/Pt and ZnO/SnO
by: Jian-Ming Lin, et al.
Published: (2006) -
The Study Of ZnO2/ZnO And Pt/ZnO Heterostructures Catalyst Preparation And Its Material Properties And Photocatalytic Degradation Of Organic Compounds
by: Jau-Yuan Chen, et al.
Published: (2012) -
Effect of annealing treatment on the optoelectronic properties of undoped ZnO films and the formation of As-doped ZnO films
by: Jia-Hao Liang, et al.
Published: (2013)