A Parallel Dual-Scanline Algorithm for Partitioning Parameterized 45-Degree Polygons
碩士 === 元智大學 === 資訊工程學系 === 100 === In the analog integrated circuit design process, researchers have proposed the concept of parameterized layouts in order to mitigate the problem of redesign iterations. Additionally, in order to use corner stitching data structure in storing parameterized layouts,...
Main Authors: | Yao-Lin Chang, 張燿麟 |
---|---|
Other Authors: | I-LunTseng |
Format: | Others |
Language: | en_US |
Online Access: | http://ndltd.ncl.edu.tw/handle/70737962716603308450 |
Similar Items
-
An Efficient Approach for Performing Boolean Mask Operations on Parameterized 45-Degree Polygons
by: Yao-I Tseng, et al. -
Extracting ridges of topographic surfaces using scanline algorithm
by: Sukmoon Chang
Published: (2009-01-01) -
A Comparison of Optimal Scanline Voxelization Algorithms
by: Håkansson, Tim
Published: (2020) -
Scanline-based distributed systems
by: Md Mizanur, Rahman
Published: (2011) -
Parallel Algorithms for Polygon Overlapping
by: FAN Junfu
Published: (2016-04-01)