| Summary: | 碩士 === 元智大學 === 化學工程與材料科學學系 === 100 === Low-pressure plasma polymerization technique was employed to deposit fluorocarbon thin film on microbial cellulose membrane and nitrocellulose membrane substrates in this study. The low-pressure plasma, generated with radio frequency power at 13.56 MHz, and monomer selected for single bond of 1,1,1,2-tetrafluoroethane (C2H2F4). The investigation examined different operational parameters including in deposition time , plasma power, and chamber pressure. The surface characteristics of the plasma polymerized films have been analyzed by Static Contact Angle measurement (CA), optical thin-film thickness detector,Scanning Electron Microscope (SEM), Energy Dispersive Spectrometer (EDS). In addition, the contact angle results based on Owen method revealed that surface free energy would decrease after C2H2F4 plasma treatment.
As a result, the fluorocarbon film under optimized operational parameters prepared in this study obtained water contact angles greater than 150◦ on MCM and NC membrane. Glycerol contact angle up to 160° lead to super-oleophobic surface on nitrocellulose membrane. The surface free energy of plasma polymerized films can decrease to 10 mJ/m2, increasing deposition thickness of C2H2F4 plasma polymerized films was achieved in rising RF plasma power. EDS analysis indicated after C2H2F4 plasma treatment, we can obtain F element on substrates surface, lead to enhance the hydrophobic properties.
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