Development of CMOS-MEMS Probe Chip
博士 === 國立臺北科技大學 === 機電科技研究所 === 100 === In this study, we use the standard TSMC 0.35 μm 2P4M process and MEMS post processing fabricate to design CMOS-MEMS probe chip. MEMS post processing involves the following steps such as lithography process, electroless nickel plating process, grinding process...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/7s32rf |