Characteristics Investigation of V2O5 Resistance Characteristics Investigation of V2O5 Resistance Random Access Memory Thin Films
碩士 === 南台科技大學 === 電子工程系 === 100 === In this study, the RF magnetron sputtering was used to deposit V2O5 thin films on the ITO/glass substrates, and then the Al electrode was deposited on the V2O5 thin film to form a Metal/Insulator/Metal structure. The effects of different oxygen con...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
101
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/43820895664706457882 |