Synthesis and Study of ZnTe Thin Films by Thermal Evaporation Technique.

碩士 === 國立聯合大學 === LED光電製程產業專班 === 100 === In this study, using thermal evaporation Preparation of ZnO / ZnTe film, ZnTe film (P-type), Zn ratio Te molar ratio of 1:0.6 and 1:0.7, coating temperature of 540℃、560℃ and 580℃ in argon gas flow100、200 sccm one hour holding time. ZnO thin films (N-type), d...

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Main Authors: Yu,Yiting, 游易庭
Other Authors: Hsu,Chenghsing
Format: Others
Language:zh-TW
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/31756389203624877941
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spelling ndltd-TW-100NUUM01240112015-10-13T21:12:26Z http://ndltd.ncl.edu.tw/handle/31756389203624877941 Synthesis and Study of ZnTe Thin Films by Thermal Evaporation Technique. 利用熱蒸鍍法製作碲化鋅薄膜與其光電特性之研究 Yu,Yiting 游易庭 碩士 國立聯合大學 LED光電製程產業專班 100 In this study, using thermal evaporation Preparation of ZnO / ZnTe film, ZnTe film (P-type), Zn ratio Te molar ratio of 1:0.6 and 1:0.7, coating temperature of 540℃、560℃ and 580℃ in argon gas flow100、200 sccm one hour holding time. ZnO thin films (N-type), deposition temperature 800℃、900℃,and holding for one hour in the atmosphere. Preparation of the completion of the test piece to the XRD、SEM、EDS analysis of thin-film crystal structure of the film microstructure,Hall effect,four-point probe analysis of thin-film electrical properties. In this study, the coating temperature 800℃ temperature one hour ZnO films held in the atmosphere, and ZnTe film fabrication of heterojunction ZnTe films best conditions for Zn Te molar ratio of 1:0.6, the deposition temperature 580℃ in argon gas flow rate of 100 sccm one hour holding time.The threshold voltage of about 4V,the reverse saturation current of approximately 7μA. Keywords: zinc telluride, zinc oxide, thermal evaporation method Hsu,Chenghsing 許正興 2012 學位論文 ; thesis 88 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立聯合大學 === LED光電製程產業專班 === 100 === In this study, using thermal evaporation Preparation of ZnO / ZnTe film, ZnTe film (P-type), Zn ratio Te molar ratio of 1:0.6 and 1:0.7, coating temperature of 540℃、560℃ and 580℃ in argon gas flow100、200 sccm one hour holding time. ZnO thin films (N-type), deposition temperature 800℃、900℃,and holding for one hour in the atmosphere. Preparation of the completion of the test piece to the XRD、SEM、EDS analysis of thin-film crystal structure of the film microstructure,Hall effect,four-point probe analysis of thin-film electrical properties. In this study, the coating temperature 800℃ temperature one hour ZnO films held in the atmosphere, and ZnTe film fabrication of heterojunction ZnTe films best conditions for Zn Te molar ratio of 1:0.6, the deposition temperature 580℃ in argon gas flow rate of 100 sccm one hour holding time.The threshold voltage of about 4V,the reverse saturation current of approximately 7μA. Keywords: zinc telluride, zinc oxide, thermal evaporation method
author2 Hsu,Chenghsing
author_facet Hsu,Chenghsing
Yu,Yiting
游易庭
author Yu,Yiting
游易庭
spellingShingle Yu,Yiting
游易庭
Synthesis and Study of ZnTe Thin Films by Thermal Evaporation Technique.
author_sort Yu,Yiting
title Synthesis and Study of ZnTe Thin Films by Thermal Evaporation Technique.
title_short Synthesis and Study of ZnTe Thin Films by Thermal Evaporation Technique.
title_full Synthesis and Study of ZnTe Thin Films by Thermal Evaporation Technique.
title_fullStr Synthesis and Study of ZnTe Thin Films by Thermal Evaporation Technique.
title_full_unstemmed Synthesis and Study of ZnTe Thin Films by Thermal Evaporation Technique.
title_sort synthesis and study of znte thin films by thermal evaporation technique.
publishDate 2012
url http://ndltd.ncl.edu.tw/handle/31756389203624877941
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