Characterization of transparent conducting ITO thin films prepared by ion beam sputter deposition
碩士 === 國立臺灣科技大學 === 電子工程系 === 100 === ITO thin films have been deposited on glass substrates by reactive ion beam sputter deposition at 25, 100 and 200?aC. The effect of growth temperature and annealing conditions on the property of ITO thin films are investigated. ITO thin films deposited at room...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/5n954q |